Laser pulse assisted nanoimprint lithography

摘要

A new method of nanofabrication- laser pulse assisted nanoimprint lithography- was investigated. The method is based on direct heating of a polymer film by laser pulse excitation, simultaneously with the imprint phase. Imprint was successfully performed into a S1805 photoresist film using fused silica stamp with additional pulses from a Nd:YAG laser excitation (power density 5, 3 GW/cm2, wavelengths 1064 and 355 nm). The imprint quality may be improved by the selection of an appropriate film material, which has high threshold of ablation and low softening point.