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Influence of surface treatments on nanocrystalline silicon

机译:表面处理对纳米晶硅的影响

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Fresh porous silicon (PS) samples show photoluminescence (PL) in visible. After a short dip in water, the PL peak shifts towards blue. However, a short dipping of PS in toluene and pentane does not change PL. The intensity of PL decreases upon exposing PS briefly to acetone. The peak position however, remains unchanged. X-Ray diffraction (XRD) and atomic force microscopy (AFM) show the presence of nanocrystals in PS. After dipping in water, XRD and AFM show structural changes. However, dipping in pentane, toluene and acetone has no effect on the XRD and AFM. Using AFM data, John-Singh model of quantum confinement explain the PL results of PS treated with water, toluene and pentane. However, the changes in PL after acetone treatment cannot be explained within this model..
机译:新鲜的多孔硅(PS)样品可见可见光致发光(PL)。短暂浸入水中后,PL峰移向蓝色。但是,将PS短时间浸入甲苯和戊烷不会改变PL。将PS短暂暴露于丙酮后,PL的强度降低。但是,峰值位置保持不变。 X射线衍射(XRD)和原子力显微镜(AFM)显示PS中存在纳米晶体。浸入水中后,XRD和AFM显示出结构变化。但是,浸入戊烷,甲苯和丙酮对XRD和AFM没有影响。使用AFM数据,John-Singh量子限制模型解释了用水,甲苯和戊烷处理的PS的PL结果。但是,该模型无法解释丙酮处理后PL的变化。

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