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Relaxor-like dielectric behavior of pulsed-laser-deposited Pb_(0.5)Sr_(0.5)TiO_3 films

机译:脉冲激光沉积Pb_(0.5)Sr_(0.5)TiO_3薄膜的弛豫样介电行为

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摘要

Pb_(0.5)Sr_(0.5)TiO_3 (PST) ferroelectric films were deposited onto Pt/Ti/SiO_2/Si substrates by pulsed laser deposition. The state of the films can be described as a mixed state, with both ferroelectric and relaxor-like features. The films exhibited high dielectric constant and tunability at room temperature. At 10 kHz, the dielectric constants of the 200-nm- and 400-nm-thick films are 771 and 971, with the tunability of 60.2% and 70.9%, respectively. The temperature-dependent dielectric properties were studied and the relaxor-like behavior was observed in both the thinner and thicker PST films, which can be established in terms of diffuse phase transition characteristics and Vogel-Fulcher relationship. In addition, the contribution of the film-electrode interface layer to the dielectric properties was evaluated and the true dielectric properties of the films were reconstructed. Consequently, the relaxor-like character of the PST films was mainly ascribed to the effect of the film-electrode interfaces.
机译:通过脉冲激光沉积将Pb_(0.5)Sr_(0.5)TiO_3(PST)铁电薄膜沉积到Pt / Ti / SiO_2 / Si衬底上。膜的状态可以被描述为具有铁电和弛豫状特征的混合状态。该膜在室温下表现出高介电常数和可调性。在10 kHz时,厚度为200 nm和400 nm的薄膜的介电常数为771和971,可调谐性分别为60.2%和70.9%。研究了随温度变化的介电性能,并在较薄和较厚的PST膜中均观察到了类似弛豫的行为,这可以根据扩散相变特性和Vogel-Fulcher关系来确定。另外,评估了膜-电极界面层对介电性能的贡献,并重建了膜的真实介电性能。因此,PST膜的类弛豫特性主要归因于膜-电极界面的作用。

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