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Polycrystalline thin films of antimony selenide via chemical bath deposition and post deposition treatments

机译:通过化学浴沉积和沉积后处理制备硒化锑多晶薄膜

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We report a method for obtaining thin films of polycrystalline antimony selenide via chemical bath deposition followed by heating the thin films at 573 K. in selenium vapor. The thin films deposited from chemical baths containing one or more soluble complexes of antimony, and selenosulfate initially did not show X-ray diffraction (XRD) patterns corresponding to crystalline antimony selenide. Composition of the films, studied by energy dispersive X-ray analyses indicated selenium deficiency. Heating these films in presence of selenium vapor at 573 K under nitrogen (2000 mTorr) resulted in an enrichment of Se in the films. XRD peaks of such films matched Sb_2Se_3. Evaluation of band gap from optical spectra of such films shows absorption due to indirect transition occurring in the range of 1-1.2 eV. The films are photosensitive, with dark conductivity of about 2× 10~(-8) (Ω cm)~(-1) and photoconductivity, about 10~(-6) (Ω cm)~(-1) under tungsten halogen lamp illumination with intensity of 700 W m~(-2). An estimate for the mobility life time product for the film is 4× 10~(-9) cm~2 V~(-1).
机译:我们报告了一种通过化学浴沉积获得多晶硒化锑薄膜的方法,然后在硒蒸汽中以573 K.加热该薄膜。从包含一种或多种锑和硒代硫酸盐的可溶性配合物的化学浴中沉积的薄膜最初没有显示出对应于硒化锑晶体的X射线衍射(XRD)模式。通过能量色散X射线分析研究的膜组成表明硒缺乏。在氮气下(2000 mTorr)在硒蒸汽存在下于573 K加热这些膜,导致膜中Se富集。此类薄膜的XRD峰与Sb_2Se_3相匹配。从这种膜的光谱评估带隙显示出由于在1-1.2 eV范围内发生的间接跃迁而引起的吸收。薄膜是光敏的,在钨丝卤素灯下暗电导率约为2×10〜(-8)(Ωcm)〜(-1),光电导率约为10〜(-6)(Ωcm)〜(-1)。照明强度为700 W m〜(-2)。薄膜的迁移率寿命乘积的估计值为4×10〜(-9)cm〜2 V〜(-1)。

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