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首页> 外文期刊>Thin Solid Films >Effect of multi-coating process on the orientation and microstructure of lead zirconate titanate (PZT) thin films derived by chemical solution deposition
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Effect of multi-coating process on the orientation and microstructure of lead zirconate titanate (PZT) thin films derived by chemical solution deposition

机译:多层涂覆工艺对化学溶液沉积法合成锆钛酸铅(PZT)薄膜取向和微观结构的影响

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This paper describes the effects of multi-coating processes on the orientation, microstructure and electrical property of lead zirconate titanate (PZT) thick films derived by chemical solution deposition. PZT thick films ( > 1 μm in thickness) were deposited by various multi-coating processes, such as layer-by-layer crystallization, seed-layering or single-crystallization. The orientation and microstructure of the thick films were characterized by X-ray diffractometry and scanning electron microscopy. For the layer-by-layer crystallization process, repeated deposition, pyrolysis at 470 or 250℃ and rapid thermal annealing (RTA) were carried out. When pyrolyzed at 470℃, the resulting films were found to be (111)-oriented with a columnar structure. When pyrolysis temperature was 250℃, the thick films were found to be (100)-oriented with a columnar structure. For seed-layering, single-coated (100)-oriented PZT thin films were utilized as a seed layer. Thick films were fabricated by repeating deposition onto the seed layer, then pyrolysis at 470℃, followed by a single RTA. We found that the upper side of the thick films was randomly oriented with a granular structure and their bottom side was (100)-oriented with a columnar structure. For the single-crystallization process, repeated deposition and pyrolysis at 470℃ followed by a single RTA resulted in randomly oriented PZT thick films with a granular structure. Electrical measurements of the (111)-oriented PZT thick films revealed a 750 dielectric constant, 21 μC/cm~2 remnant polarization and 50 kV/cm coercive field. The same properties for the (100)-oriented PZT thick films were 1250, 14 μC/cm~2 and 29 kV/cm, respectively.
机译:本文描述了多层涂布工艺对化学溶液沉积法衍生的钛酸锆钛酸铅(PZT)厚膜的取向,微观结构和电性能的影响。 PZT厚膜(厚度> 1μm)通过各种多层涂覆工艺沉积,例如逐层结晶,种子层沉积或单晶。通过X射线衍射和扫描电子显微镜表征了厚膜的取向和微观结构。对于逐层结晶过程,进行了重复沉积,在470或250℃下热解以及快速热退火(RTA)。当在470℃下热解时,发现所得膜为(111)取向的柱状结构。热解温度为250℃时,发现厚膜为(100)取向的柱状结构。对于种子层,将单涂层(100)取向的PZT薄膜用作种子层。通过在籽晶层上重复沉积,然后在470℃下热解,然后再进行一次RTA,制得厚膜。我们发现,厚膜的上侧是随机取向的颗粒状结构,而其下侧是(100)取向的柱状结构。对于单晶过程,在470℃下重复沉积和热解,然后进行单个RTA,得到具有颗粒结构的随机取向的PZT厚膜。对(111)取向的PZT厚膜的电学测量显示出750的介电常数,21μC/ cm〜2的剩余极化强度和50 kV / cm的矫顽场。 (100)取向的PZT厚膜的相同性能分别为1250、14μC/ cm〜2和29 kV / cm。

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