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Optoelectronical properties of indium sulfide thin films prepared by spray pyrolysis for photovoltaic applications

机译:喷雾热解法制备的光伏应用硫化铟薄膜的光电性能

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Indium sulfide (In_2S_3) thin films have been prepared by the spray pyrolysis (SP) technique using indium acetate and N-N dimethyl thiourea as precursor compounds. Samples prepared at different temperatures and atomic ratio of In to S in the starting solution, (In/S)_(sol), have been characterized using several techniques. X-ray diffraction studies have shown that the preparation temperature (T_p) affects the crystallinity of the deposited materials as well as the optoelectronic properties. For (In/S)_(sol)=1/8, the optical band gap (E_g) increases from 2.2 up to 2.67 eV when T_p increases from 250 up to 450℃. For (In/S)_(sol)=1 and T_p=450℃, the deposited material shows n-type electrical conductivity with a dark value of 1 (Ωcm)~(-1), and E_g=2.04 eV. The In_2S_3 thin films prepared under these conditions have a big potential use as a window material for photovoltaic heterojunction devices.
机译:硫化铟(In_2S_3)薄膜已通过喷雾热解(SP)技术制备,使用乙酸铟和N-N二甲基硫脲作为前体化合物。已使用多种技术对在不同温度下以及起始溶液中In与S的原子比(In / S)_(sol)制备的样品进行了表征。 X射线衍射研究表明,制备温度(T_p)影响沉积材料的结晶度以及光电性能。对于(In / S)_(sol)= 1/8,当T_p从250升高到450℃时,光学带隙(E_g)从2.2升高到2.67 eV。当(In / S)_(sol)= 1且T_p = 450℃时,沉积材料呈现n型电导率,暗值为1(Ωcm)〜(-1),E_g = 2.04 eV。在这些条件下制备的In_2S_3薄膜作为光伏异质结器件的窗材料具有很大的潜在用途。

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