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首页> 外文期刊>Thin Solid Films >Raman measurements and stress analysis in gallium ion-implanted gallium nitride epitaxial layers on sapphire
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Raman measurements and stress analysis in gallium ion-implanted gallium nitride epitaxial layers on sapphire

机译:蓝宝石上注入镓离子的氮化镓外延层的拉曼测量和应力分析

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摘要

In this article, we estimate hydrostatic stress developed in gallium ion-implanted gallium nitride epitaxial layers using Raman measurements. We have calculated deformation potential constants for E_2(high) mode in these epi-layers. The presence of a polar phonon-plasmon coupling in these systems has also been demonstrated. In as-implanted samples, with an increase in implantation fluence, we have observed disorder-activated Raman scattering.
机译:在本文中,我们估计使用拉曼测量在植入镓离子的氮化镓外延层中产生的静水应力。我们已经计算出这些外延层中E_2(high)模式的变形势常数。还证明了在这些系统中极性声子-等离子体耦合的存在。在植入的样品中,随着注入通量的增加,我们观察到了无序激活的拉曼散射。

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