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Effect of substrate temperature and annealing treatment on the electrical and optical properties of silver-based multilayer coating electrodes

机译:衬底温度和退火处理对银基多层涂层电极电和光学性能的影响

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摘要

Multilayer coatings consisting of thin silver layers sandwiched between layers of transparent conducting metal oxides are investigated from the view point of low-resistance electrodes for use in flat panel displays, solar cells, etc. ZnO/Ag/ZnO multilayer films were prepared on glass substrates by simultaneous RF magnetron sputtering of ZnO and dc magnetron sputtering of Ag. Optimization of the deposition conditions of both ZnO layers and metallic layers were performed for better electrical and optical properties. The structural, electrical and optical properties of the films (deposited at room temperature, different substrate temperature and annealed at different conditions) were characterized with various techniques. We could not produce high-quality transparent conductive electrodes simply by annealing at various temperatures. However, improved electrical properties and a considerable shift in the transmittance curves was observed after heat treatment. The experimental results show that the electrical resistivity of as-grown films can be decreased to 10~(-5) Ω cm level with post-annealing at 400℃ for 2 h in vacuum atmosphere. After heat treatment, the sheet resistance was reduced as much as 20% which was due to the increased grain size of Ag film. The samples heat treated at 200-400℃ under vacuum or nitrogen atmosphere showed the best electrical properties. The key to the superior electrical and optical properties of the multilayer is the optimization of growth conditions of the silver layer by careful control of the oxide properties and the use of appropriate annealing temperature and atmosphere.
机译:从用于平板显示器,太阳能电池等的低电阻电极的角度研究了由薄银层夹在透明导电金属氧化物层之间组成的多层涂层。在玻璃基板上制备了ZnO / Ag / ZnO多层膜通过同时进行ZnO的射频磁控溅射和Ag的直流磁控溅射。为了获得更好的电学和光学性能,对ZnO层和金属层的沉积条件进行了优化。用各种技术表征薄膜的结构,电学和光学性质(在室温下沉积,在不同的基板温度下并在不同的条件下退火)。我们不能简单地通过在各种温度下退火来生产高质量的透明导电电极。然而,热处理后观察到改善的电性能和透射率曲线的相当大的偏移。实验结果表明,在真空气氛下,于400℃下进行2 h退火后,成膜后的电阻率可降低至10〜(-5)Ωcm。热处理后,由于增加了Ag膜的晶粒尺寸,使薄膜电阻降低了20%。在真空或氮气气氛下于200-400℃热处理的样品表现出最佳的电性能。多层的优异电和光学性能的关键是通过仔细控制氧化物性能以及使用适当的退火温度和气氛来优化银层的生长条件。

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