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Optical and structural properties of vanadium pentoxide films prepared by d.c. reactive magnetron sputtering

机译:用直流电法制备的五氧化二钒薄膜的光学和结构性能。反应磁控溅射

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Vanadium pentoxide films were deposited onto glass substrates at different substrate temperatures (RT - 400 degrees C) by d.c. reactive magnetron sputtering. The structural properties of the films were studied by X-ray diffraction, scanning electron microscopy and Raman spectra. The optical properties of the films were studied by measuring and fitting the transmittance. The film prepared at low temperature showed a high optical transmittance. The film prepared at the substrate temperature lower than 200 degrees C has an amorphous structure and the film prepared at substrate temperatures higher than 200 degrees C had a polycrystalline V2O5 structure. The optical parameters of the films were calculated by fitting the transmittance using the classical model. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过直流电,在不同的基板温度(RT-400摄氏度)下,五氧化二钒薄膜沉积在玻璃基板上。反应磁控溅射。通过X射线衍射,扫描电子显微镜和拉曼光谱研究了膜的结构性能。通过测量和拟合透射率来研究膜的光学性质。在低温下制备的膜显示出高的光学透射率。在低于200℃的基板温度下制备的膜具有非晶结构,并且在高于200℃的基板温度下制备的膜具有多晶V 2 O 5结构。通过使用经典模型拟合透射率来计算膜的光学参数。 (c)2005 Elsevier B.V.保留所有权利。

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