首页> 外文期刊>Thin Solid Films >Saddle field fast atom beam source: A new low pressure plasma nitriding method for a alloy Ti-6Al-4V
【24h】

Saddle field fast atom beam source: A new low pressure plasma nitriding method for a alloy Ti-6Al-4V

机译:鞍场快速原子束源:Ti-6Al-4V合金的低压等离子体氮化新方法

获取原文
获取原文并翻译 | 示例
       

摘要

Ti and its alloys (Ti-6Al-4V) have been used in different engineering applications due to their several outstanding properties. Nevertheless, their use in practical applications is limited in many cases due to their poor tribological property. Researches are ongoing on surface modification of Ti based materials by different plasma and ion based techniques to overcome this problem. However, the conventional plasma nitriding techniques have several problems such as formation of an arc, increased possibility of surface contamination due to a comparatively higher operating pressure, production of a very thin nitrided layer after a long processing time, etc. In this present work, the possibility of a new low-pressure plasma nitriding process using a Plasma Enhanced Chemical Vapor Deposition (PECVD) based saddle field fast atom beam source on a Ti-6Al-4Valloy sample is investigated. Plasma nitriding was carried out at 900 degrees C and at a pressure 0.1 Pa for 8 h by using a beam current 0.5 A. Optical Microscopy investigation of the cross-section of the nitrided sample revealed a compound nitrided layer (thickness approximately 16 mu m) followed by a diffusion layer. X-Ray Diffraction (XRD) analysis confirmed the presence of a TiN phase in the nitrided layers. A roughly three fold higher hardness value (1578 HV0.015) in the top nitriding layer was observed by Vickers microhardness testing compared to hardness value of untreated sample (568 HV0.015),with a gradually decreasing hardness in the core material. The results show that this is a promising method for low pressure plasma nitriding of Ti alloy within a short processing time compared to the conventional nitriding process. (c) 2005 Elsevier B.V. All rights reserved.
机译:钛及其合金(Ti-6Al-4V)具有多种优异的性能,已在不同的工程应用中使用。然而,由于它们的摩擦学性能差,在许多情况下它们在实际应用中的使用受到限制。为了克服该问题,正在进行通过不同的基于等离子体和离子的技术对基于Ti的材料进行表面改性的研究。但是,常规的等离子体氮化技术存在几个问题,例如形成电弧,由于相对较高的工作压力而导致表面污染的可能性增加,经过很长的加工时间后会形成非常薄的氮化层等。研究了在Ti-6Al-4Valloy样品上使用基于等离子增强化学气相沉积(PECVD)的鞍场快速原子束源进行新的低压等离子体氮化工艺的可能性。通过使用0.5 A的束流在900摄氏度和0.1 Pa的压力下进行8 h等离子体氮化。光学显微镜检查氮化样品的横截面,发现化合物氮化层(厚度约16μm)其次是扩散层。 X射线衍射(XRD)分析证实氮化层中存在TiN相。通过维氏显微硬度测试,顶部氮化层的硬度值(1578 HV0.015)比未经处理的样品(568 HV0.015)的硬度值高大约三倍,芯材的硬度逐渐降低。结果表明,与常规氮化工艺相比,这是一种在较短的处理时间内对Ti合金进行低压等离子体氮化的有前途的方法。 (c)2005 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号