Magnetron plasma-enhanced chemical vapor deposition of diamond-like carbon thin films

摘要

An RF magnetron plasma-enhanced chemical vapor deposition system with variable magnetic field (MagPECVD) was utilized for high rate deposition of diamond-like carbon thin films. Deposition rate was nonuniform, with minimum value of 30 nm/min in the center of the cathode where the low ionic flux is determined by the absence of the E x B electronic drift. The highest value of 1029 nm/min was registered in the position of the cathode with the highest ion flux determined by the presence of the E x B electronic drift. Hardness, elastic modulus and RMS roughness of thin films were dependent on local values of magnetic field intensities and the values of input power.