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Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition

机译:通过金属有机化学气相沉积在GaAs上生长的InSb薄膜的光学和传输性质

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摘要

Optical and transport properties of InSb thin films grown on GaAs by metalorganic chemical vapor deposition (MOCVD) have been investigated by far-infrared (FIR) reflectance spectroscopy. The lattice vibration behaviors of a series of MOCVD InSb/GaAs(100) materials grown under different growth conditions were studied. Effects of Ⅲ-Ⅴ source ratios on the films crystalline quality were examined. Two additional weak modes in the wavenumber regions of 210-240 cm~(-1) were observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate, which are related to the uniformity of film thickness and crystalline perfection. The dielectric constant, phonon modes and other optical parameters, as well as transport properties including carrier concentration, mobility, effective mass were calculated theoretically and compared with experimental results. The obtained distribution values of the InSb LO phonon mode frequency, line width, relative integrated intensity ratio between the forbidden and defect-related TO phonon and the allowed LO mode are adopted as figures of merit for the quality of the InSb films. The electrical transport properties of carrier concentration, mobility, and effective mass as well as the dielectric constant of these films have been determined by optical method non-destructively.
机译:通过远红外(FIR)反射光谱研究了通过金属有机化学气相沉积(MOCVD)在GaAs上生长的InSb薄膜的光学和传输性质。研究了在不同生长条件下生长的一系列MOCVD InSb / GaAs(100)材料的晶格振动行为。研究了Ⅲ-Ⅴ源比例对薄膜结晶质量的影响。在210-240 cm〜(-1)的波数区域内观察到另外两个弱模,它们在低温下显得更为突出。干涉条纹效应会改变GaAs基板的FIR反射带,这与薄膜厚度的均匀性和晶体完美度有关。从理论上计算了介电常数,声子模和其他光学参数,以及包括载流子浓度,迁移率,有效质量在内的传输性质,并与实验结果进行了比较。所获得的InSb LO声子模式频率,线宽,与缺陷相关的TO声子与允许的LO模式之间的相对积分强度比和允许的LO模式的分布值被用作InSb膜质量的品质因数。这些膜的载流子浓度,迁移率和有效质量以及介电常数的电传输特性已通过光学方法无损测定。

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