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Low temperature photoluminescence and infrared dielectric functions of pulsed laser deposited ZnO thin films on silicon

机译:脉冲激光沉积在硅上的ZnO薄膜的低温光致发光和红外介电功能

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摘要

C-axis oriented ZnO thin films were grown on silicon (100) and (111) substrates by pulsed laser deposition. Low temperature photoluminescence spectra show besides the peaks of free excitons, of defect bound excitons, and of a donor-acceptor pair transition a new doublet at 3.328/3.332 eV. The doublet seems to originate from the columnar textured ZnO film structure. A corresponding structural dependence of the broadening parameter of the infrared dielectric functions was derived from spectroscopic ellipsometry in the spectral range from 380 to 1200 cm~(-1). The wave numbers of the E_1 transverse optical and A_1 longitudinal optical phonon modes of the ZnO films on silicon are determined to be 406 and 573 cm~(-1), respectively. These values are slightly smaller than those of single-crystalline ZnO thin films on sapphire.
机译:通过脉冲激光沉积在硅(100)和(111)衬底上生长C轴取向的ZnO薄膜。低温光致发光光谱显示,除了游离激子的峰,缺陷结合的激子和供体-受体对的峰在3.328 / 3.332 eV处跃迁了新的双峰。双峰似乎起源于柱状织构的ZnO薄膜结构。由椭圆偏振光谱法在380〜1200 cm〜(-1)的光谱范围内推导了红外介电函数展宽参数的结构相关性。确定硅上ZnO薄膜的E_1横向光学声子模和A_1纵向光学声子模的波数分别为406和573 cm〜(-1)。这些值略小于蓝宝石上单晶ZnO薄膜的值。

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