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Nanocrystalline growth and grain-size effects in Au-Cu electrodeposits

机译:金铜电沉积中的纳米晶体生长和晶粒尺寸效应

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摘要

The processing-structure-property relationship is investigated for electrodeposited foils of the gold-copper alloy system. A model is presented that relates the deposition process parameters to the nanocrystalline grain size. An activation energy of 1.52 eV atom~(-1) for growth is determined for a long-pulse ( > 10 msec) mode, and is 0.16 eV atom~(-1) for short pulses ( < 5 msec). The effect of nanocrystalline grain size on the mechanical properties is assessed using indentation measurements. A Hall-Petch type variation of the Vickers microhardness with nanocrystalline grain size ( > 6 nm) is observed for Au-Cu samples with 1-12 wt.% Cu as tested in cross-section. The hardness increases three-fold from a rule-of-mixtures value < 1 GPa to a maximum of 2.9 GPa.
机译:研究了金铜合金体系电沉积箔的加工结构与性能的关系。提出了将沉积工艺参数与纳米晶粒尺寸相关的模型。对于长脉冲(> 10毫秒)模式,确定了1.52 eV原子〜(-1)的生长活化能;对于短脉冲(<5毫秒),其活化能为0.16 eV原子〜(-1)。使用压痕测量评估纳米晶粒尺寸对机械性能的影响。对于具有1-12wt。%Cu的Au-Cu样品,在横截面中测试,观察到具有纳米晶粒尺寸(> 6nm)的维氏显微硬度的霍尔-帕奇(Hall-Petch)类型变化。硬度从小于1 GPa的混合规则值增加到最大2.9 GPa的三倍。

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