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Structural, electrical and optical properties of indium-tin-oxide thin films prepared by pulsed laser deposition

机译:通过脉冲激光沉积制备的铟锡氧化物薄膜的结构,电学和光学性质

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In this work the indium-tin-oxide (ITO) thin films have been prepared by pulsed laser deposition on glass substrate. The structural, electrical and optical properties of the films have been studied as a function of substrate temperature and background deposition pressure. The dielectric function of ITO films was obtained in the wave-length range 220-2400 nm by fitting the measured transmission and reflection spectra to a dispersion relation, which combines the Drude model and Lorentz oscillator. The correlation between deposition conditions and physical properties of ITO films was observed and analysed.
机译:在这项工作中,通过在玻璃基板上脉冲激光沉积制备了氧化铟锡(ITO)薄膜。已经研究了膜的结构,电学和光学性质与基材温度和背景沉积压力的关系。通过将测得的透射光谱和反射光谱拟合为色散关系,将德鲁德模型和洛伦兹振荡器相结合,可以在220至2400 nm的波长范围内获得ITO膜的介电功能。观察并分析了ITO薄膜的沉积条件与物理性能之间的相关性。

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