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Determination of optical constants and thicknesses of In_2O_3:Sn films from transmittance data

机译:根据透射率数据确定In_2O_3:Sn薄膜的光学常数和厚度

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Indium tin oxide (ITO) thin films were deposited on quartz substrates by direct current magnetron sputtering and annealed in N_2 and air. The normal incidence transmittance of the films was measured by a spectrophotometer. The electrical parameters such as carrier concentration, mobility and resistivity were investigated by van der Pauw method. An optical model has been proposed to simulate the optical constants and thicknesses of the films from transmittance data, which combines the Forouhi-Bloomer model and modified Drude model. The relaxation energy in the Drude term is taken as energy-dependent for a better fitting in the visible spectral range. The simulated transmittance is in good agreement with the measured spectrum in the whole measurement wavelength range. The electrical parameters obtained from the optical simulation are well consistent with those measured electrically by van der Pauw method. The experimental results also indicate that the different post-deposition annealing treatments yield the distinct optical and electrical properties of ITO films.
机译:通过直流磁控溅射将氧化铟锡(ITO)薄膜沉积在石英基板上,并在N_2和空气中退火。膜的法向入射透射率通过分光光度计测定。用van der Pauw方法研究了电学参数,例如载流子浓度,迁移率和电阻率。提出了一个光学模型,可以根据透射率数据模拟薄膜的光学常数和厚度,该模型结合了Forouhi-Bloomer模型和改进的Drude模型。 Drude项中的弛豫能量被视为依赖于能量,以便更好地拟合可见光谱范围。在整个测量波长范围内,模拟的透射率与测量的光谱高度吻合。从光学模拟获得的电参数与通过范德堡方法进行电测量的电参数非常一致。实验结果还表明,不同的沉积后退火处理可产生ITO膜不同的光学和电学性质。

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