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Properties of Cu(In,Ga)(S,Se)_2 thin films prepared by selenization/sulfurization of metallic alloys

机译:金属合金硒化/硫化制备Cu(In,Ga)(S,Se)_2薄膜的性能

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摘要

Single-phase Cu(In,Ga)(S,Se)_2 (CIGSS) thin films have been prepared using a two-step process consisting of annealing of Cu-In-Ga precursors in S/Se ambient. Full characterizations have been carried out using XRD, SEM, EDS, Raman spectroscopy and optical absorption measurements. The depth profiles of constituent elements Cu, In, Ga, S and Se were almost constant throughout the film. Depending on overall Ga content and recrystallization temperature CIGSS thin films exhibited a shift in band gap from 1.04 to 1.19 eV.
机译:单相Cu(In,Ga)(S,Se)_2(CIGSS)薄膜已使用两步法制备,该过程包括在S / Se环境中退火Cu-In-Ga前驱体。使用XRD,SEM,EDS,拉曼光谱和光吸收测量进行了全面表征。在整个膜中,组成元素Cu,In,Ga,S和Se的深度轮廓几乎恒定。取决于总的Ga含量和重结晶温度,CIGSS薄膜的带隙从1.04 eV变到1.19 eV。

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