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首页> 外文期刊>Thin Solid Films >Monitoring In-Ga interdiffusion during chalcopyrite formation in Ga_xS_y-(Cu,In) photovoltaic precursor layers
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Monitoring In-Ga interdiffusion during chalcopyrite formation in Ga_xS_y-(Cu,In) photovoltaic precursor layers

机译:监测Ga_xS_y-(Cu,In)光伏前驱层中黄铜矿形成过程中的In-Ga互扩散

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摘要

Phase transformations of Ga_xS_y—(Cu,In) thin film stacks annealed in sulphur vapour were investigated by in-situ energy dispersive X-ray diffraction (EDXRD) in order to monitor the Ga incorporation into the resulting quaternary Cu(In,Ga)S_2 alloy. The partial replacement of In by Ga in the chalcopyrite structure widens the band gap of the material. Thereby the open circuit voltage of corresponding devices can be enhanced. In the present study Ga was supplied by an amorphous or crystallized (Ga_xS_y)-layer, deposited by thermal evaporation of Ga_2S_3 before sputtering elemental Cu and In precursor layers. The sulphurisation was carried out in a specially designed vacuum chamber which can be attached to the synchrotron beamline F3 at Hasylab (Hamburg). The evolution of the different phases during sulphurisation of the Ga_xS_y-(Cu, In) precursors, as observed via EDXRD, indicated the almost simultaneous occurrence of two stacked chalcopyrite phases which are Ga-rich and In-rich. For longer annealing times the EDXRD-spectra show the appearance of a third, intermediate Cu(In,Ga)S_2 phase. Monitoring the peak position during the annealing stage allows evaluating the lattice parameters as a function of annealing time. Thereby the In-Ga interdiffusion between the different chalcopyrite phases can be investigated.
机译:通过原位能量色散X射线衍射(EDXRD)研究了在硫蒸汽中退火的Ga_xS_y-(Cu,In)薄膜堆叠的相变,以监测Ga掺入所得四元Cu(In,Ga)S_2中的情况。合金。在黄铜矿结构中用Ga部分取代In会扩大材料的带隙。因此,可以提高相应设备的开路电压。在本研究中,Ga由非晶或结晶(Ga_xS_y)层提供,该层通过在溅射元素Cu和In前驱物层之前通过热蒸发Ga_2S_3来沉积。硫化是在专门设计的真空室中进行的,该真空室可以连接到位于Hasylab(汉堡)的同步辐射线F3。如通过EDXRD观察到的,Ga_xS_y-(Cu,In)前体的硫化过程中不同相的演变表明,几乎同时出现了富Ga和富In的两个堆叠的黄铜矿相。对于更长的退火时间,EDXRD光谱显示出第三中间Cu(In,Ga)S_2相的出现。在退火阶段监控峰值位置可以评估晶格参数作为退火时间的函数。因此,可以研究不同黄铜矿相之间的In-Ga互扩散。

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