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Comparison of optical and electrical gap of electrodeposited CuIn(S,Se)_2 determined by spectral photo response and Ⅰ-Ⅴ-T measurements

机译:光谱光响应法和Ⅰ-Ⅴ-T法测定电沉积CuIn(S,Se)_2的光学和电学间隙的比较

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The knowledge of the absorber band gap of heterojunction solar cells is of crucial importance, because it helps to investigate the band offsets at the buffer/absorber heterointerface. Usually this gap is deduced from optical techniques such as Spectral Photo Response (SPR). However, for inhomogeneous materials, this method of estimating the band gap is dominated by the lowest value somewhere inside the absorber layer, and SPR alone cannot give any indication about the spatial location of the region concerned with this measured value. Nevertheless, to determine the nature of band offsets at the heterointerface, we need a more accurate and local value of the gap next to the interface. In this study, dark Ⅰ-Ⅴ-T measurements were performed to characterize the gap within the CuIn(S,Se)_2 (CISS) Space Charge Region (SCR) near the CdS buffer layer. Under forward bias conditions, several recombination mechanisms occur in the CdS/CISS solar cells, each of them being characterised by a specific activation energy. One of these activation energies is related to the gap of the CISS SCR near the buffer/absorber heterointerface. We present a detailed study of the gap of electrodeposited CISS, determined from Ⅰ-Ⅴ-T measurements and its evolution with various CdS deposition conditions. The obtained gap values are found to be 200 to 300 meV higher than those derived from SPR. We explain this difference by the occurrence of graded CISS gap, with a gap value next to the heterointerface higher than the bulk gap value.
机译:异质结太阳能电池吸收带隙的知识至关重要,因为它有助于研究缓冲/吸收剂异质界面的带偏移。通常,此差距是由光学技术(如光谱光响应(SPR))推导出来的。但是,对于不均匀的材料,这种估计带隙的方法主要受吸收层内部某处的最低值支配,并且单独的SPR不能给出与该测量值有关的区域的空间位置的任何迹象。尽管如此,要确定异质接口处的带偏移性质,我们需要接口附近的间隙的更准确且局部的值。在这项研究中,进行了暗Ⅰ-Ⅴ-T测量以表征CdS缓冲层附近CuIn(S,Se)_2(CISS)空间电荷区(SCR)内的间隙。在正向偏置条件下,CdS / CISS太阳能电池中会发生几种重组机制,每个重组机制都具有特定的活化能。这些活化能之一与缓冲/吸收剂异质界面附近的CISS SCR的间隙有关。我们对电沉积CISS的间隙进行了详细的研究,该间隙由Ⅰ-Ⅴ-T测量确定,并且随着各种CdS沉积条件的发展而变化。发现获得的间隙值比从SPR获得的间隙值高200至300meV。我们通过分级CISS间隙的发生来解释这种差异,其中,邻近异质界面的间隙值高于整体间隙值。

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