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Atmospheric plasma-calcination of mesoporous tungsten oxide utilizing plasma dielectric barrier discharge

机译:利用等离子体介电势垒放电进行介孔氧化钨的大气等离子体煅烧

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摘要

The fabrication of mesoporous tungsten oxide films by spin-coating method followed by an atmospheric plasma-calcination method is described and discussed here. For the calcination process the dielectric barrier discharge system generating homogenous atmospheric plasma discharge was designed and used. By this method, large surface area mesoporous films, with disordered pores of average diameter size of about 4 to 5 nm were synthesized. All the plasma-calcined films exhibit amorphous structure. The process of calcination was evaluated by FT-IR spectroscopy and in comparison with other methods a very high speed of calcination process was achieved.
机译:在此描述并讨论了通过旋涂法和随后的大气等离子体煅烧法制备中孔氧化钨薄膜。在煅烧过程中,设计并使用了产生均匀大气等离子体放电的介电势垒放电系统。通过这种方法,合成了具有平均孔径为约4至5nm的无序孔的大表面积中孔膜。所有等离子体煅烧的膜均显示出非晶结构。通过FT-IR光谱法评估了煅烧过程,并且与其他方法相比,实现了非常高的煅烧过程速度。

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