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首页> 外文期刊>Thin Solid Films >Influence of thermal annealing on photoluminescence and structural properties of N,N′-diphenyl-N,N′-bis(1 -naphthylphenyl)-1, 1′-biphenyl-4,4′-diamine (α-NPD) organic thin films
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Influence of thermal annealing on photoluminescence and structural properties of N,N′-diphenyl-N,N′-bis(1 -naphthylphenyl)-1, 1′-biphenyl-4,4′-diamine (α-NPD) organic thin films

机译:热退火对N,N'-二苯基-N,N'-双(1-萘基苯基)-1,1'-联苯-4,4'-二胺(α-NPD)有机薄膜的光致发光和结构性能的影响

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摘要

Photoluminescence (PL) spectra and intensities of thin N,N′-diphenyl-N,N′-bis(l-naphthylphenyl)-1,1′-biphenyl-4,4′-diamine (α-NPD) films have been measured at room temperature, during sample heating with various rates and annealing times at constant temperatures, and after annealing. It was found that the temperature of T = 80℃ being considerably lower than the glass transition temperature of α-NPD is sufficient to cause substantial irreversible changes in PL and PL excitation characteristics. A PL efficiency increase up to 10 times, an emission spectrum short-wavelength shift up to 130 meV and a spectral narrowing from 69 to 39 nm are reached using annealing. The surface roughness of the films annealed at the moderate temperature of 80℃ does not undergo observable changes contrary to films annealed at higher temperatures.
机译:已测量了N,N'-二苯基-N,N'-双(1-萘基苯基)-1,1'-Biphenyl-4,4'-二胺(α-NPD)薄膜的光致发光(PL)光谱和强度在室温下,在样品加热过程中以及在恒定温度下以各种速率和退火时间进行退火之后。结果发现,T = 80℃的温度明显低于α-NPD的玻璃化转变温度,足以引起PL和PL激发特性的不可逆变化。使用退火可以实现高达10倍的PL效率提高,高达130 meV的发射光谱短波长偏移以及从69到39 nm的光谱变窄。与在较高温度下退火的薄膜相反,在80℃的中等温度下退火的薄膜的表面粗糙度不会发生明显的变化。

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