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Synthesis Of Liquid Polysilisiquioxane Resins And Properties Of Cured Films

机译:液态聚硅倍半氧烷树脂的合成及固化膜的性能

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摘要

Two kinds of UV-patternable liquid polysilisiquioxane (PSQ) resins (one was named as PSQ-L152 and the refractive index of its cured film was 1.5212 at 1310 nm, the other was named as PSQ.-L145 and the refractive index of its cured film was 1.4483 at 1310 nm) have been synthesized by alternative sol-gel process for waveguide application. Chemical structures of the two resins were characterised by Fourier-transformed infrared spectroscopy (FTIR) and ~(29)Si nuclear magnetic resonance technique. And the hybrid curing processes were also investigated by FTIR, and discussed the dependence of optical loss on thermal curing temperature and time. In addition, refractive indices of the films can be exactly tuned from 1.4483 to 1.5212 and optical losses of the PSQ-L152 film were about 0.2 dB·cm~(-1) at 1310 nm, 0.7 dB·cm~(-1) at 1550 nm, respectively. Furthermore, the films also showed low surface roughness and outstanding thermal stability both in nitrogen and air atmospheres.
机译:两种可UV图案化的液态聚硅倍半氧烷(PSQ)树脂(一种名为PSQ-L152,其固化膜在1310 nm处的折射率为1.5212,另一种称为PSQ.-L145及其固化后的折射率膜是在1310nm处为1.4483)(通过交替的溶胶-凝胶工艺合成的)用于波导应用。通过傅里叶变换红外光谱(FTIR)和〜(29)Si核磁共振技术表征了这两种树脂的化学结构。并通过FTIR对混合固化过程进行了研究,并讨论了光损失对热固化温度和时间的依赖性。另外,薄膜的折射率可以精确地从1.4483调整到1.5212,PSQ-L152薄膜的光损耗在1310 nm时约为0.2 dB·cm〜(-1),在1010 nm时为0.7 dB·cm〜(-1)。分别为1550 nm。此外,该膜在氮气和空气气氛中还显示出低的表面粗糙度和优异的热稳定性。

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