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Influence Of The Crystal Orientation Of Substrate On Low Temperature Synthesis Of Silicon Nanowires From Si_2h_6

机译:衬底的晶体取向对Si_2h_6低温合成硅纳米线的影响

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SiNW synthesis by vapor-liquid-solid (VLS) growth mechanism has been reported by many authors but a deep understanding of the key factors affecting the nanowire growth is still lacking. Here, we report a thorough investigations of the SiNW growth by employing silicon substrates with different crystal orientations and surface preparation using Au thin film as a catalyst. We observed that the activity of the Au particles strongly depends on the crystal orientation and the substrate surface preparation significantly affects the properties of SiNWs. We found that the density and growth rate of nanowires is different in a temperature dependent growth on Si(100) from Si(111). We found that the density and growth rate of nanowires is different at different crystal orientations of the substrates. We have grown nearly uniform diameter and micrometer long SiNWs by using Si_2H_6 as a source gas in low pressure chemical vapor deposition around eutectic temperature. The length of the SiNWs can be controlled mainly by varying the growth time.
机译:许多作者已经报道了通过气-液-固(VLS)生长机理进行的SiNW合成,但是仍然缺乏对影响纳米线生长的关键因素的深入了解。在这里,我们报告了通过使用具有不同晶体取向的硅基板以及使用Au薄膜作为催化剂的表面处理对SiNW生长进行的全面研究。我们观察到,Au颗粒的活性在很大程度上取决于晶体的取向,并且基材的表面制备会显着影响SiNWs的性能。我们发现纳米线的密度和生长速率在温度依赖性地从Si(111)到Si(100)的生长中是不同的。我们发现,纳米线的密度和生长速率在衬底的不同晶体取向上是不同的。通过在低共晶温度附近进行低压化学气相沉积中,使用Si_2H_6作为原料气,我们已经生长出几乎均匀的直径和微米长的SiNW。 SiNW的长度可以主要通过改变生长时间来控制。

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