首页> 外文期刊>Thin Solid Films >Thickness effect on field electron emission of silicon emitter arrays coated with sol-gel Ba_(0.65)Sr_(0.35)TiO_3 and (Ba_(0.65)Sr_(0.35))_(0.75)La_(0.25)TiO_3 thin films
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Thickness effect on field electron emission of silicon emitter arrays coated with sol-gel Ba_(0.65)Sr_(0.35)TiO_3 and (Ba_(0.65)Sr_(0.35))_(0.75)La_(0.25)TiO_3 thin films

机译:厚度对涂有溶胶凝胶Ba_(0.65)Sr_(0.35)TiO_3和(Ba_(0.65)Sr_(0.35))_(0.75)La_(0.25)TiO_3薄膜的硅发射体阵列的场电子发射的影响

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摘要

Ba_(0.65)Sr_(0.35)TiO_3 (BST) and (Ba_(0.65)Sr_(0.35))_(0.75)La_(0.25)TiO_3 (BSLT) thin films with different thicknesses have been deposited onto silicon field emitter arrays (FEAs) using sol-gel technology for field electron emission applications. The BST-coated Si FEAs demonstrate an enhancement of electron emission, but the threshold field is BST film thickness dependence. The study reveals that the film thickness dependence of electron emission is due to the various microstructural features developed in BST films with different thicknesses. The crystallinity in perovskite films is improved with the increasing film thickness. The 15-nm-thick BST film is amorphous in nature, and then the polycrystalline perovskite grains are formed on the top of the amorphous layer in the thicker film. BSLT-coated Si FEAs also exhibit similar thickness-dependent field emission enhancement behavior, but thick BSLT samples (≥ 60 nm) have much significant enhancement of field emission compared with similar thickness BST samples due to effective supply of emitted electrons in the bulk region of electron-doped BSLT coatings.
机译:已将具有不同厚度的Ba_(0.65)Sr_(0.35)TiO_3(BST)和(Ba_(0.65)Sr_(0.35))_(0.75)La_(0.25)TiO_3(BSLT)薄膜沉积到硅场发射器阵列(FEA)上)使用溶胶-凝胶技术进行场电子发射应用。 BST涂层的Si FEA表现出电子发射的增强,但阈值场取决于BST膜厚度。研究表明,电子发射的膜厚度依赖性是由于具有不同厚度的BST膜具有各种微结构特征。钙钛矿薄膜的结晶度随薄膜厚度的增加而提高。 15nm厚的BST膜本质上是非晶态的,然后在较厚的膜中非晶态层的顶部形成多晶钙钛矿晶粒。涂有BSLT的Si FEA也表现出类似的厚度依赖性场发射增强行为,但是与BSST相似的厚度相比,厚的BSLT样品(≥60 nm)具有显着的场发射增强效果,这是因为有效地提供了BST体区域中的发射电子。电子掺杂的BSLT涂层。

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