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Effect Of Microstructure And Surface Morphology Evolution On Optical Properties Of Nd-modified Pb(zr_xti_(1-x))o_3 Thin Films

机译:显微组织和表面形貌演变对Nd改性Pb(zr_xti_(1-x))o_3薄膜光学性能的影响

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摘要

Optical properties of nanocrystalline Nd-modified lead-zirconate-titanate thin films were studied. Pulsed laser deposition was used for thin-film fabrication at room temperature. Thin films were deposited on single-crystal MgO (100) substrates and post-annealed between temperatures 400 ℃-1000 ℃. The crystal structure and thin film morphology were studied using x-ray diffraction technique and atomic force microscopy, respectively. The optical transmission spectra of the films were measured at UV-vis-IR wavelengths and the results were utilized to obtain the refraction index n, extinction coefficient k, and the value of the band gap E_g. Thin films annealed at different temperatures had a different crystal structure and morphology. Film thickness and annealing temperature also had an effect on the crystal orientation of the films. Trigonal and tetragonal phases co-existed in analyzed films so that films with thickness of 150 nm had strong tetragonal orientation with increasing post-annealing temperature. Trigonal and tetragonal phase co-existence was present in films with thickness of 300 nm post-annealed at low temperatures. Optical absorption edge shifted to shorter wavelengths with decreasing film thickness and post-annealing temperature which led to increase in band gap energies. Atomic force microscopy studies showed a clear dependence of films root mean square roughness on post-annealing temperature and crystal structure.
机译:研究了纳米晶Nd改性锆钛酸铅薄膜的光学性能。脉冲激光沉积用于室温下的薄膜制造。将薄膜沉积在MgO(100)单晶衬底上,并在400℃-1000℃之间进行后退火。分别使用X射线衍射技术和原子力显微镜研究了晶体结构和薄膜形态。在UV-vis-IR波长下测量膜的光学透射光谱,并利用结果获得折射率n,消光系数k和带隙E_g的值。在不同温度下退火的薄膜具有不同的晶体结构和形态。膜的厚度和退火温度也对膜的晶体取向有影响。在分析的薄膜中共存有三角形和四方相,因此随着退火温度的升高,厚度为150 nm的薄膜具有很强的四方取向。低温后退火后,厚度为300 nm的薄膜中存在三角相和四方相。随着膜厚度和退火后温度的降低,光吸收边缘转移到较短的波长,这导致带隙能量的增加。原子力显微镜研究表明,膜的均方根粗糙度与退火后温度和晶体结构有明显的相关性。

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