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首页> 外文期刊>Thin Solid Films >Growth And Characterization Of Epitaxial La_(0.7)ca_(0.3)mno_3 Thin Films By Metal-organic Deposition On (laalo_3)_(0.3)-(sraltao_6)_(0.7) Substrates
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Growth And Characterization Of Epitaxial La_(0.7)ca_(0.3)mno_3 Thin Films By Metal-organic Deposition On (laalo_3)_(0.3)-(sraltao_6)_(0.7) Substrates

机译:(laalo_3)_(0.3)-(sraltao_6)_(0.7)衬底上金属有机沉积制备外延La_(0.7)ca_(0.3)mno_3薄膜及其表征

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摘要

Thin films of La_(0.7)Ca_(0.3)MnO_3 (LCMO) have been grown epitaxially on (001) single-crystal substrates of (LaAlO_3)_(0.3)-(SrAlTaO_6)_(0.7) by metal-organic deposition. The microstructures of the LCMO films were investigated by transmission electron microscopy (TEM) on cross-sections. High-resolution TEM observations demonstrated a good quality of epitaxy throughout the entire film thickness. For bolometric application, we calculated the temperature coefficients of resistance (TCR) from the temperature dependence of the resistance. Large value of TCR of approximately 22% at 250 K was obtained for the 80 nm thick film.
机译:通过金属有机沉积,在(LaAlO_3)_(0.3)-(SrAlTaO_6)_(0.7)的(001)单晶衬底上外延生长了La_(0.7)Ca_(0.3)MnO_3(LCMO)薄膜。通过透射电子显微镜(TEM)在横截面上研究了LCMO膜的微观结构。高分辨率TEM观察表明,在整个薄膜厚度中外延质量均良好。对于辐射热测量应用,我们根据电阻的温度依赖性计算了电阻的温度系数(TCR)。对于80 nm厚的薄膜,在250 K时获得的TCR值约为22%。

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