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Effect of bias application on c-BN synthesis by induction thermal plasmas under atmospheric pressure

机译:大气压下偏压对感应热等离子体合成c-BN的影响

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摘要

Synthesis of c-BN was enhanced with DC bias application on the substrate in atmospheric pressure induction plasmas in this study. Previous c-BN synthesis has been performed under reduced pressure using explosive and hazardous gases. For industrial application such as coating on cutting tools, improvement of c-BN synthesis method has been strongly required. Therefore, the purpose of this paper is to investigate the mechanism of enhanced c-BN synthesis with bias application using safe starting material, h-BN and boron powder, under atmospheric pressure. The bias application leads to the optimum B/N ratio as well as the reduction of oxygen impurity in the deposits, resulting in the successful c-BN synthesis under atmospheric pressure. Important process for c-BN formation is attributed to the formation of high density of activated species such as N~+, and the quenching process on the substrate. We conclude that bias application is important to increase activated species.
机译:在本研究中,通过在衬底上的大气压感应等离子体中施加直流偏压可增强c-BN的合成。先前的c-BN合成是使用爆炸性和有害气体在减压下进行的。对于工业应用,例如切削工具上的涂层,强烈需要改进c-BN合成方法。因此,本文的目的是研究在大气压下使用安全的起始原料h-BN和硼粉通过偏压施加促进c-BN合成的机理。施加偏压可导致最佳的B / N比以及减少沉积物中的氧杂质,从而在大气压下成功完成c-BN合成。 c-BN形成的重要过程归因于高密度的活化物质(如N〜+)的形成,以及底物上的淬灭过程。我们得出结论,施加偏见对增加活化物种很重要。

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