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首页> 外文期刊>Thin Solid Films >The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition
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The effect of the ion beam energy on the properties of indium tin oxide thin films prepared by ion beam assisted deposition

机译:离子束能量对离子束辅助沉积制备的铟锡氧化物薄膜性能的影响

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摘要

Indium tin oxide (ITO) thin films have been deposited onto polycarbonate substrates by ion beam assisted deposition technique at room temperature. The structural, optical and electrical properties of the films have been characterized by X-ray diffraction,
机译:铟锡氧化物(ITO)薄膜已通过离子束辅助沉积技术在室温下沉积到聚碳酸酯基板上。薄膜的结构,光学和电学特性已通过X射线衍射表征,

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