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首页> 外文期刊>Thin Solid Films >Multiferroic properties of BiFeO_3/Bi_4Ti_3O_(12) double-layered thin films fabricated by chemical solution deposition
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Multiferroic properties of BiFeO_3/Bi_4Ti_3O_(12) double-layered thin films fabricated by chemical solution deposition

机译:化学溶液沉积法制备BiFeO_3 / Bi_4Ti_3O_(12)双层薄膜的多铁性

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摘要

Multiferroic BiFeO_3/Bi_4O_(12) (BFO/BTO) double-layered film was fabricated on a Pt(111)/Ti/SiO_2/Si(100) substrate by a chemical solution deposition method. The effect of an interfacial BTO layer on electrical and magnetic properties of BFO was investigated by comparing those of pure BFO and BTO films prepared by the same condition. The X-ray diffraction result showed that no additional phase was formed in the double-layered film, except BFO and BTO phases. The remnant polarization (2P_r) of the double-layered film capacitor was 100 μC/cm~2 at 250 kV/cm, which is much larger than that of the pure BFO film capacitor. The magnetization-magnetic field hysteresis loop revealed weak ferromagnetic response with remnant magnetization (2M_r) of 0.4 kA/m. The values of dielectric constant and dielectric loss of the double-layered film capacitor were 240 and 0.03 at 100 kHz, respectively. Leakage current density measured from the double-layered film capacitor was 6.1 × 10~(-7) A/cm~2 at 50 kV/cm, which is lower than the pure BFO and BTO film capacitors.
机译:通过化学溶液沉积法在Pt(111)/ Ti / SiO_2 / Si(100)衬底上制备了多铁性BiFeO_3 / Bi_4O_(12)(BFO / BTO)双层薄膜。通过比较纯BFO和在相同条件下制备的BTO膜的界面,研究了界面BTO层对BFO的电磁性能的影响。 X射线衍射结果表明,除了BFO和BTO相外,在双层膜中没有形成其他相。双层薄膜电容器的残余极化强度(2P_r)在250 kV / cm时为100μC/ cm〜2,远大于纯BFO薄膜电容器的残余极化强度(2P_r)。磁化磁场磁滞回线显示出弱的铁磁响应,剩余磁化强度(2M_r)为0.4 kA / m。双层膜电容器在100kHz下的介电常数和介电损耗的值分别为240和0.03。从双层薄膜电容器测得的漏电流密度在50 kV / cm时为6.1×10〜(-7)A / cm〜2,低于纯BFO和BTO薄膜电容器。

著录项

  • 来源
    《Thin Solid Films》 |2009年第24期|6737-6741|共5页
  • 作者单位

    Department of Physics, Changwon National University, Changwon, Kyungnam 641-773, Republic of Korea;

    Department of Physics, Changwon National University, Changwon, Kyungnam 641-773, Republic of Korea;

    Department of Physics, Changwon National University, Changwon, Kyungnam 641-773, Republic of Korea;

    Department of Physics, Changwon National University, Changwon, Kyungnam 641-773, Republic of Korea;

    Department of Physics, Changwon National University, Changwon, Kyungnam 641-773, Republic of Korea;

    Department of Physics, Changwon National University, Changwon, Kyungnam 641-773, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    BiFeO_3/Bi_4Ti_3O_(12) double-layered thin films; chemical solution deposition; multiferroic properties;

    机译:BiFeO_3 / Bi_4Ti_3O_(12)双层薄膜;化学溶液沉积;多铁性;

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