机译:平衡磁控溅射沉积(Al,Si)N膜的表征
College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;
College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;
College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;
College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;
College of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China;
nanocomposite film; magnetron sputtering; hardness; optical transmittance; scanning electron microscopy;
机译:通过不平衡磁控溅射法沉积的氧化铋薄膜的特征。
机译:总气压对脉冲直流平衡磁控溅射系统沉积CrAlN薄膜组织和性能的影响
机译:直流磁控溅射和大功率脉冲磁控溅射在不同工作压力下沉积的AlN薄膜的结构性能和残余应力的比较
机译:R.F的ZnO薄膜沉积在植物基质上的ZnO薄膜的特征。磁控溅射
机译:射频反应磁控溅射在低温下沉积在硅上的压电氮化铝薄膜的声波器件特性
机译:反应性射频磁控溅射沉积β-WO3薄膜的HRTEM显微结构表征
机译:通过高功率脉冲磁控溅射和直流磁控溅射在含氢等离子体中沉积的β-Ta和α-Cr薄膜