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Effects of annealing atmosphere on microstructure and ferroelectric properties of praseodymium-doped Bi_4Ti_3O_(12) thin films prepared by sol-gel method

机译:退火气氛对掺-的Bi_4Ti_3O_(12)薄膜的溶胶-凝胶法制备及其组织和铁电性能的影响

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摘要

Praseodymium-substituted bismuth titanate (Bi_(3.2)Pr_(0.8)Ti_3O_(12), BPTO) thin films were successfully deposited on Pt(111)/Ti/SiO_2/Si(100) substrates by spin coating with a sol-gel technology and rapid thermal annealing. The effects of annealing atmospheres (vacuum, ambient atmosphere and oxygen) on the growth and properties of thin films were investigated. The results show that the intensity of the (117) diffraction peak of (Bi_(3.2)Pr_(0.8)Ti_3O_(12) film annealed in oxygen is stronger than those annealed in ambient atmosphere and vacuum. The XRD spectra demonstrated that a highly (117) orientation could be obtained when the (Bi_(3.2)Pr_(0.8)Ti_3O_(12) thin film was annealed in an oxygen-sufficient environment. The BPTO thin films annealed in oxygen atmosphere exhibits the maximum remanent polarization (2P_r) of 49 μC/cm~2 and a low coercive field (2E_c) of 130 kV/cm, fatigue free characteristics up to ≧10~(11) switching cycles. These results indicate that the BPTO thin film is useful in nonvolatile ferroelectric random access memory applications.
机译:通过溶胶-凝胶技术旋涂成功地将取代的钛酸铋(Bi_(3.2)Pr_(0.8)Ti_3O_(12),BPTO)薄膜成功沉积在Pt(111)/ Ti / SiO_2 / Si(100)衬底上和快速的热退火。研究了退火气氛(真空,环境气氛和氧气)对薄膜生长和性能的影响。结果表明,在氧气中退火的(Bi_(3.2)Pr_(0.8)Ti_3O_(12)膜的(117)衍射峰的强度比在环境大气和真空中退火的强。当(Bi_(3.2)Pr_(0.8)Ti_3O_(12)薄膜在氧气充足的环境中退火时,可以获得117)取向。在氧气气氛中退火的BPTO薄膜表现出最大剩余极化(2P_r)为49 μC/ cm〜2且130 kV / cm的低矫顽场(2E_c),高达≥10〜(11)个开关周期的无疲劳特性,这些结果表明BPTO薄膜可用于非易失性铁电随机存取存储器应用。

著录项

  • 来源
    《Thin Solid Films》 |2009年第17期|4818-4821|共4页
  • 作者单位

    Department of Electronic Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

    Department of Electronic Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

    Department of Electrical Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

    Department of Electronic Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

    Department of Electrical Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

    Department of Electrical Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

    Department of Electrical Engineering, Hsiuping Institute of Technology, Taichung 412, Taiwan;

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  • 正文语种 eng
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  • 关键词

    sol-gel process; bismuth titanate; ferroelectric; annealing atmophere;

    机译:溶胶-凝胶法钛酸铋铁电退火气氛;

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