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Reactive Magnetron Sputtering Of Cuins_2 Absorbers For Thin Film Solar Cells: Problems And Prospects

机译:薄膜太阳能电池Cuins_2吸收体的反应磁控溅射:问题与展望

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We have investigated the reactive magnetron sputtering process from copper and indium targets in Ar/H_2S sputtering atmospheres for the deposition of CuInS_2 absorber films. This large area deposition method is in principle suited for the preparation of absorbers of good electronic quality. One of our best CuInS_2 cells exhibits an efficiency of 11.4% and an open circuit voltage of 745 mV, the highest reported value for CulnS_2 cells. However, it was found that the reproducibility of the photovoltaic layer properties is low. By analyzing the different defects in the films, it was found that the main defects are microscopic pin holes and crevices, which lead to short circuits. The intrinsic electronic quality of the magnetron sputtered CulnS_2 films is excellent, proven by room temperature photoluminescence spectroscopy. The occurrence of short circuits depends decisively on the film morphology, which is determined by the copper-to-indium ratio during the deposition. Even for constant external deposition parameters this ratio changes over the life time of the targets, mainly caused by a significant decrease of the indium deposition rate. For a stable CuInS_2 film deposition process an in situ control of the Cu/In ratio and the film morphology is advisable.
机译:我们已经研究了在Ar / H_2S溅射气氛中铜和铟靶材的反应磁控溅射工艺,用于沉积CuInS_2吸收膜。这种大面积沉积方法原则上适合于制备具有良好电子质量的吸收剂。我们最好的CuInS_2电池之一显示出11.4%的效率和745 mV的开路电压,这是CulnS_2电池的最高报道值。然而,发现光伏层特性的可再现性低。通过分析膜中的不同缺陷,发现主要缺陷是微观的针孔和缝隙,这会导致短路。磁控溅射CulnS_2薄膜的固有电子质量非常好,这已通过室温光致发光光谱法证明。短路的发生决定性地取决于薄膜的形貌,该形貌由沉积过程中的铜铟比率决定。即使对于恒定的外部沉积参数,该比例也会随着靶材的寿命而变化,这主要是由于铟沉积速率的显着降低所致。对于稳定的CuInS_2薄膜沉积工艺,建议原位控制Cu / In比例和薄膜形态。

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