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首页> 外文期刊>Thin Solid Films >Radio Frequency Sputter Deposition Of High-quality Conductive And Transparent Zno: Al Films On Polymer Substrates For Thin Film Solar Cells Applications
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Radio Frequency Sputter Deposition Of High-quality Conductive And Transparent Zno: Al Films On Polymer Substrates For Thin Film Solar Cells Applications

机译:高质量导电透明Zno:薄膜太阳能电池聚合物基板上的射频溅射沉积

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摘要

Thick aluminum-doped zinc oxide films were deposited at substrate temperatures from 100 ℃ to room temperature on polyethylene terephthalate by radio frequency magnetron sputtering, varying the deposition parameters such as radio frequency power and working pressure. Structural, optical and electrical properties were analyzed using an x-ray diffractometer, a spectrophotometer and a four-point probe, respectively. Films were polycrystalline showing a strong preferred c-axis orientation (002). The best optical and electrical results were achieved using a substrate temperature of 100 ℃. Furthermore, high transmittances close to 80% in the visible wavelength range were obtained for those films deposited at the lowest Argon pressure used of 0.2 Pa. In addition, resistivities as low as 1.1 × 10~(-2) Ω cm were reached deposited at a RF power of 75 W. Finally, a comparison of the properties of the films deposited on polymer and glass substrates was performed, obtaining values of the figure of merit for the films on polymer comparable to those obtained on glass substrates, 17,700 Ω~(-1) cm~(-1) vs 14,900 Ω~(-1) cm~(-1), respectively.
机译:通过射频磁控溅射在衬底温度从100℃到室温的条件下,将厚铝掺杂氧化锌膜沉积在聚对苯二甲酸乙二醇酯上,改变沉积参数,例如射频功率和工作压力。使用X射线衍射仪,分光光度计和四点探针分别分析结构,光学和电学性质。薄膜是多晶的,显示出强烈的优选c轴方向(002)。使用100℃的基板温度可获得最佳的光电性能。此外,对于在使用的最低氩气压力为0.2 Pa的情况下沉积的那些薄膜,在可见光波长范围内获得了接近80%的高透射率。此外,在1.5 MPa下沉积的电阻率低至1.1×10〜(-2)Ωcm。射频功率为75W。最后,对沉积在聚合物和玻璃基板上的薄膜的性能进行了比较,得出与在玻璃基板上获得的薄膜相当的品质因数值17,700Ω〜( -1)cm〜(-1)与14,900Ω〜(-1)cm〜(-1)。

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