机译:Lanio_3电极和过量氧化铅对化学溶液沉积衍生Pb(zr_x,ti_(1-x))o_3膜的影响
Chemical Engineering Department, Technion, Haifa 32000, Israel;
lanio_3 (lno); pb(zr_x; ti_(1-x))o_3(pzt); chemical solution deposition (csd);
机译:具有反应物Pb(C_2H_5)_4,Zr(Ot-C_4H_9)_4,Ti(Oi-C_3H_7)的各种氧化物电极上化学气相沉积Pb(Zr_x,Ti_(1-x))O_3膜的组成和晶相控制_4和O_2
机译:膜厚对化学溶液沉积衍生Pb(Zr_xTi_(1-x))O_3 / LaNiO_3 / Si电学性能的影响
机译:化学溶液沉积法对xPb(Mg_(1/3)Nb_(2/3))O_3-(1-x)Pb(Zr_(0.5)Ti_(0.5))O_3薄膜的组成改性的影响
机译:通过电磁喷涂沉积制造厚PB(Zr_x,Ti_(1-X))O_3(PZT)膜的膜
机译:镧镍氧化物电极上MOCVD衍生的钙钛矿铅锆(x)钛(1-x)氧(3)和铅(scan钽)(1-x)钛(x)氧(3)薄膜的微观结构和电性能缓冲硅
机译:水溶液化学沉积法制备无铅Bi0.5Na0.5TiO3薄膜
机译:铅基铁电薄膜的光化学溶液沉积:最终避免过量添加PbO
机译:脉冲激光沉积外延sr(Ru(sub x)sn(sub 1-x))O(sub 3)薄膜电极和KNbO(sub 3)/ sr(Ru(sub x)sn(sub 1-x)) O(sub 3)双层