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Lowering Of L1_0 Phase Transition Temperature Of Fept Thin Films By Single Shot H~+ Ion Exposure Using Plasma Focus Device

机译:通过等离子聚焦装置单次H〜+离子暴露降低Fept薄膜的L1_0相变温度

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摘要

FePt thin films are exposed to pulsed energetic H~+ ion beam from plasma focus. In irradiated films, the phase transition from the low K_u disordered face-centered-cubic structure to high K_u ordered face-centered-tetragonal phase was achieved at 400 ℃ with the order parameter S ranging from 0.73 to 0.83, high coercivity of about 5356 kA/m, high negative nucleation field of about 7700 kA/m and high squareness ratio ranging from 0.73 to 0.79. The advantage of using plasma focus device is that it can lower phase transition temperature and significantly enhance the magnetic properties by a pulsed single shot exposure.
机译:FePt薄膜暴露于来自等离子体聚焦的脉冲高能H〜+离子束中。在辐照薄膜中,在400℃下,从低K_u无序的面心立方结构到高K_u有序面心四方相的相变达到了阶数参数S为0.73至0.83,高矫顽力约为5356 kA / m,约7700 kA / m的高负形核场和0.73至0.79的高矩形比。使用等离子聚焦装置的优势在于它可以降低相变温度并通过脉冲单次曝光显着增强磁性能。

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