...
首页> 外文期刊>Thin Solid Films >Improved Conductivity Of Zno Through Codoping With In And Al
【24h】

Improved Conductivity Of Zno Through Codoping With In And Al

机译:通过与In和Al共掺杂改善Zno的电导率

获取原文
获取原文并翻译 | 示例
           

摘要

We have studied the effect of codoping ZnO with AI and In using composition spreads prepared by off-axis rf sputtering. We find a large improvement in the electrical conductivity of doped ZnO and attribute this to size compensation, as inferred by measuring the volume of the unit cell as a function of composition. Adding a small amount of In to Al-doped ZnO results in an increase in the fraction of Al dopant atoms that are activated, and the mobility remains high as well. Codoping allows for a higher conductivity than single-doping in films deposited at a modest temperature with no post annealing.
机译:我们已经研究了通过使用离轴射频溅射制备的成分分布来将ZnO与AI和In共掺杂的效果。我们发现掺杂的ZnO的电导率有了很大的改善,并将其归因于尺寸补偿,这是通过测量晶胞的体积与成分的关系得出的。将少量In添加到Al掺杂的ZnO中会导致被激活的Al掺杂原子的比例增加,并且迁移率也保持很高。共掺杂比在适度温度下沉积的薄膜具有更高的电导率,而无后退火。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号