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Zirconia thin film preparation by wet chemical methods at low temperature

机译:低温湿化学法制备氧化锆薄膜

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摘要

In this study the preparation of zirconia thin films with a high refractive index at low temperature is aimed for. Two non-hydrolytic type approaches of wet chemical synthesis are presented. Both by sol-gel and colloid chemistry, highly transmissive, smooth thin films of zirconia cubic and/or tetragonal crystalline phases were readily prepared after annealing at only 400 ℃. The thin films show indices of refraction varying between 1.7 and 1.9 for annealing temperatures in the range 200-400 ℃.
机译:在这项研究中,目标是在低温下制备具有高折射率的氧化锆薄膜。提出了两种湿法化学合成的非水解型方法。通过溶胶-凝胶和胶体化学,仅在400℃退火后就可以容易地制备出高透射率,光滑的氧化锆立方和/或四方晶相薄膜。在200-400℃的退火温度下,薄膜的折射率在1.7至1.9之间变化。

著录项

  • 来源
    《Thin Solid Films》 |2010年第2期|p.630-634|共5页
  • 作者单位

    Philips Research, High Tech Campus 4, 5656 AE Eindhoven, the Netherlands,IMEC, Kapeldreef 75, 3000 Leuven, Belgium;

    Philips Lighting, Mathildelaan 1, 5600 JM Eindhoven, the Netherlands;

    Philips Research, High Tech Campus 4, 5656 AE Eindhoven, the Netherlands;

    Philips Research MiPlaza, High Tech Campus 11, 5656 AE Eindhoven, the Netherlands;

    Philips Research MiPlaza, High Tech Campus 11, 5656 AE Eindhoven, the Netherlands,Eindhoven University of Technology, Department of Applied Physics, P.O. Box 513, 5600 MB Eindhoven, the Netherlands;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    sol-gel coatings; colloid chemistry; high refractive index materials; zirconia;

    机译:溶胶-凝胶涂料;胶体化学高折射率材料;氧化锆;

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