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机译:从熔融磁控管靶高速反应沉积含少量Zr的SiO_2透明薄膜
Department of Physics, Faculty of Applied Sciences, University of West Bohemia, Univerzitni 22, 306 14 Plzen, Czech Republic;
Department of Physics, Faculty of Applied Sciences, University of West Bohemia, Univerzitni 22, 306 14 Plzen, Czech Republic;
Department of Physics, Faculty of Applied Sciences, University of West Bohemia, Univerzitni 22, 306 14 Plzen, Czech Republic;
sputtering; evaporation; reactive deposition; target power density; molten target; deposition rate; thin films;
机译:利用Sn-Ta金属烧结靶通过反应磁控溅射高速沉积Ta掺杂的SnO_2薄膜
机译:使用合金靶材通过反应磁控溅射高速沉积高质量的Sn掺杂In_2O_3薄膜
机译:硬度透明Zro2膜的反应中频交流磁控溅射中的沉积速率的增强
机译:高功率脉冲直流磁控溅射对二氧化锆透明膜的高反应性沉积
机译:直流反应磁控溅射沉积的新型薄膜透明导电氧化物。
机译:TiO2光催化薄膜的高速低温直流脉冲磁控溅射:重复频率的影响
机译:磁控溅射从复合靶材上沉积的低氧化学计量外延ZrB2薄膜:沉积温度和溅射功率的影响