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机译:沉积距离和温度对射频磁控溅射镓掺杂氧化锌的电,光和结构性能的影响
University of Florida, Materials Science and Engineering Department, Gainesville, Florida, USA;
Department of Physics and Astronomy, University of Denver, Denver, Colorado, USA;
National Renewable Energy Laboratory, Golden, Colorado, USA;
Department of Electrical, Computer, and Energy Engineering, University of Colorado, Boulder, Colorado, USA;
National Renewable Energy Laboratory, Golden, Colorado, USA;
University of Florida, Materials Science and Engineering Department, Gainesville, Florida, USA;
National Renewable Energy Laboratory, Golden, Colorado, USA;
National Renewable Energy Laboratory, Golden, Colorado, USA;
gallium-doped zinc oxide; radio-frequency magnetron sputtering; structural properties; optical properties; electronic properties;
机译:离子束辅助沉积制备镓掺杂氧化锌薄膜的电学和光学性质
机译:低温射频磁控溅射沉积低电阻率掺杂镓的氧化锌膜
机译:铟的添加和后退火对直流磁控溅射沉积镓掺杂氧化锌薄膜的结构,电学和光学性能的影响
机译:不同沉积温度制备的纳米四脚形氧化锌薄膜的电和结构性质
机译:掺杂镓的镁锌氧化物体系的电学和光学性质。
机译:脉冲激光沉积法制备氧化锌层的结构光学和电学性质
机译:基材温度对磁控溅射层逐层掺杂锌氧化物薄膜结构,光学和电性能的影响