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Unipolar resistive switching behavior of BiFeO_3 thin films prepared by chemical solution deposition

机译:化学溶液沉积法制备BiFeO_3薄膜的单极电阻转换行为

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摘要

Bismuth ferrite (BiFeO_3, BFO) thin films were spin-coated on Pt/Ti/SKVSi substrates by a chemical solution deposition method. The ferroelectric BFO films annealed at 500 ℃ and 550 ℃ were found to possess unipolar resistive switching behaviors. The resistance ratio of the high resistance state (HRS) to the low resistance state (LRS) of the unipolar resistance switching is about 10~3 for the ferroelectric BFO films. The conduction mechanisms are concluded to be space charge-limited conduction for the initial state and Ohmic conduction for the LRS. As for the HRS, the Poole-Frenkel emission fits well in the whole voltage region. Traps composed of oxygen vacancies are considered to play a key role in forming conducting paths. The relaxation time of electronic carriers is much shorter than that of ionic oxygen vacancies; therefore, the resistance switching is considered more probably due to carrier injection and emission through the Poole-Frenkel model after forming.
机译:通过化学溶液沉积法将铁酸铋(BiFeO_3,BFO)薄膜旋涂在Pt / Ti / SKVSi衬底上。发现在500℃和550℃退火的铁电BFO膜具有单极电阻切换行为。对于铁电BFO膜,单极电阻切换的高电阻状态(HRS)与低电阻状态(LRS)的电阻比约为10〜3。对于初始状态,该传导机制被认为是空间电荷受限的传导,对于LRS则是欧姆传导。至于HRS,Poole-Frenkel发射非常适合整个电压区域。由氧空位组成的陷阱被认为在形成导电路径中起关键作用。电子载流子的弛豫时间比离子空位的弛豫时间短得多。因此,电阻转换被认为更可能是由于载流子注入和通过形成后通过Poole-Frenkel模型的发射。

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