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Characteristics of carbon coatings on optical fibers prepared by radio-frequency plasma enhanced chemical vapor deposition with different H_2/C_2H_2 ratios

机译:射频等离子体增强化学气相沉积不同H_2 / C_2H_2比的光纤上碳涂层的特性

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摘要

Characteristics of carbon coatings on optical fibers prepared by radio-frequency plasma enhanced chemical vapor deposition with different H_2/C_2H_2 ratios are investigated. Five kinds of carbon coatings are prepared with H_2/C_2H_2 ratios of 2,4,6,8, and 10. Experimental results show that the deposition rate and surface roughness of carbon coatings decrease as the H_2/C_2H_2 ratio increases. When the H_2/C_2H_2 ratio changes from 2 to 8, the increase of H_2/C_2H_2 ratios detrimentally yields sp3 carbon atoms and sp~3-CH_3 bonds in the carbon coatings. However, when the H_2/C_2H_2 ratio exceeds 8, the hydrogen retards the growth of the graphite structure. Moreover, the redundant hydrogen radicals favor bonding with the dangling bonds in the coating surface. Therefore, when the H_2/C_2H_2 ratio increases from 8 to 10, the amounts of sp3 carbon atoms and sp~3-CH_3 bonds in the carbon coatings increase. At an H_2/C_2H_2 ratio of 8, the carbon coating exhibits excellent water-repellency and thermal-loading resistance, and so this ratio is the best for producing a hermetically sealed optical fiber coating.
机译:研究了不同比例的H_2 / C_2H_2比的射频等离子体化学气相沉积制备的光纤上碳涂层的特性。制备了5种H_2 / C_2H_2比分别为2、4、6、8和10的碳涂层。实验结果表明,随着H_2 / C_2H_2比的增加,碳涂层的沉积速率和表面粗糙度降低。当H_2 / C_2H_2的比值从2变为8时,H_2 / C_2H_2的比值的增加不利地在碳涂层中产生sp3碳原子和sp〜3-CH_3键。然而,当H_2 / C_2H_2的比率超过8时,氢阻碍了石墨结构的生长。此外,多余的氢自由基有利于与涂层表面中的悬挂键结合。因此,当H_2 / C_2H_2的比例从8增加到10时,碳涂层中sp3碳原子和sp〜3-CH_3键的数量增加。在H_2 / C_2H_2的比率为8时,碳涂层表现出优异的拒水性和抗热负荷性,因此该比率最适合用于生产密封光纤涂层。

著录项

  • 来源
    《Thin Solid Films》 |2010年第24期|p.7492-7496|共5页
  • 作者单位

    Department of Materials Science and Engineering, National Chung Hsing University 250 Kuo Kuang Road, Taichung 402, Taiwan;

    Department of Materials Science and Engineering, National Chung Hsing University 250 Kuo Kuang Road, Taichung 402, Taiwan;

    Department of Materials Science and Engineering, National Chung Hsing University 250 Kuo Kuang Road, Taichung 402, Taiwan;

    Mechanical and Systems Research Laboratories, Industrial Technology Research Institute, Hsinchu 310, Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    carbon; chemical vapor deposition; microstructure; morphology;

    机译:碳;化学气相沉积;微观结构形态学;

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