...
机译:离子束溅射沉积法制备纳米晶铟锡氧化物薄膜的表征
National Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
rnNational Institute of Advanced Industrial Science and Technology (AIST), Sendai 983-8551, Japan;
ion beam sputtering; indium tin oxide; thin films; electrical conductivity; optical transmittance; scanning electcron microscopy; atomic force microscopy; X-ray diffraction;
机译:离子束溅射沉积法沉积在玻璃和粘土基底上的氧化铟锡薄膜的性能
机译:在室温下通过离子束溅射沉积在室温下在倾斜角度下制备氧化铟锡膜的纳米结构和物理性质控制
机译:离子束溅射沉积法在玻璃和粘土基底上制备纳米晶ITO薄膜并表征
机译:沉积温度对射频磁控溅射制备透明导电铟锡氧化物薄膜性能的影响
机译:通过轧制溅射沉积工艺沉积在柔性玻璃基板上的氧化铟锌,氧化铟锡和钼薄膜的表征
机译:反应磁控溅射制备的电致变色铟锡锌氧化物薄膜
机译:离子束辅助沉积技术在不同离子束电流下制备的铟锡氧化物薄膜
机译:锂钴氧化物薄膜的溅射沉积和表征及其在薄膜可充电锂电池中的应用