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Atomic oxygen generation by in-situ plasma and post-plasma in dielectric barrier discharges for surface treatment

机译:介电势垒放电中原位等离子体和后等离子体产生的原子氧,用于表面处理

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摘要

Atomic oxygen (AO) generation is experimentally and numerically investigated for in-situ plasma and post-plasma produced by dielectric barrier discharges (DBDs) for surface treatment. The AO generation in in-situ plasma inside a DBD reactor is closely related to the plasma characteristics depending on the applied voltage and O_2 additive concentration, while the AO density distribution along the post-plasma ejected outside the reactor exit is influenced by the AO generation in the in-situ plasma, gas flow rate, and effluent distance. Contact angle measurements show that the metal surface characteristics, which are treated by in-situ plasma and post-plasma, respectively, are distinctive from each other depending on the AO densities.
机译:对于通过介电势垒放电(DBD)进行表面处理而产生的原位等离子体和后等离子体进行了实验和数值研究,研究了原子氧(AO)的产生。 DBD反应器内部原位等离子体的AO生成与等离子体特性密切相关,这取决于施加的电压和O_2添加剂的浓度,而沿着AO生成的沿反应器出口外部的等离子后沿AO密度分布原位等离子体,气体流速和出水距离。接触角测量结果表明,根据AO密度,分别用原位等离子体和后等离子体处理的金属表面特性彼此不同。

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