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首页> 外文期刊>Thin Solid Films >Anode material properties of Ga-doped ZnO thin films by pulsed DC magnetron sputtering method for organic light emitting diodes
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Anode material properties of Ga-doped ZnO thin films by pulsed DC magnetron sputtering method for organic light emitting diodes

机译:脉冲直流磁控溅射法制备有机发光二极管Ga掺杂ZnO薄膜的阳极材料性能

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摘要

This study examined the anode material properties of Ga-doped zinc oxide (GZO) thin films deposited by pulsed DC magnetron sputtering along with the device performance of organic light emitting diodes (OLEDs) using GZO as the anode. The structure and electrical properties of the deposited films were examined as a function of the substrate temperature. The electrical properties of the GZO film deposited at 200 ℃ showed the best properties, such as a low resistivity, high mobility and high work function of 5.3×10~(-1)Ω cm, 9.9 cm~2/Vs and 4.37 eV, respectively. The OLED characteristics with the GZO film deposited under the optimum conditions showed good brightness > 10,000 cd/m~2. These results suggest that GZO films can be used as the anode in OLEDs, and a lower deposition temperature of 200 ℃ is suitable for flexible devices.
机译:这项研究检查了通过脉冲直流磁控溅射沉积的Ga掺杂的氧化锌(GZO)薄膜的阳极材料性能,以及使用GZO作为阳极的有机发光二极管(OLED)的器件性能。检查沉积膜的结构和电性能与基材温度的关系。 200℃下沉积的GZO薄膜的电学性能最好,电阻率低,迁移率高,功函数高,分别为5.3×10〜(-1)Ωcm,9.9 cm〜2 / Vs和4.37 eV,分别。在最佳条件下沉积GZO膜的OLED特性显示出> 10,000 cd / m〜2的良好亮度。这些结果表明,GZO膜可以用作OLED的阳极,并且200℃的较低沉积温度适用于柔性器件。

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