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首页> 外文期刊>Thin Solid Films >Light-emitting characteristics of organic light-emitting diodes with the MoO_x-doped NPB and C_(60)/LiF layer
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Light-emitting characteristics of organic light-emitting diodes with the MoO_x-doped NPB and C_(60)/LiF layer

机译:掺杂MoO_x的NPB和C_(60)/ LiF层的有机发光二极管的发光特性

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The hole ohmic properties of the MoO_x-doped NPB layer have been investigated by analyzing the current density-voltage properties of hole-only devices and by assigning the energy levels of ultraviolet photoemission spectra. The result showed that the performance of organic light-emitting diodes (OLEDs) is markedly improved by optimizing both the thickness and the doping concentration of a hole-injecting layer (HIL) of N, N'-diphenyl-N, N'-bis(l-naphthyl)-1,1'-biphenyl-4,4'-diamine (NPB) doped with molybdenum oxide (MoO_x) which was inserted between indium tin oxide (ITO) and NPB. For the doping concentration of above 25%, the device composed of a glass/ITO/MoO_x-doped NPB (100 nm)/Al structure showed the excellent hole ohmic property. The investigation of the valence band structure revealed that the p-type doping effects in the HTL layer and the hole concentration increased at the anode interfaces cause the hole-injecting barrier lowering. With both MoO_x-doped NPB as a hole ohmic contact and C_(60)/LiF as an electron ohmic contact, the device, which is composed of glass/ITO/MoO_x-doped NPB (25%, 5 nm)/NPB (63 nm)/Alq_3 (37 nm)/C_(60) (5 nm)/ LiF (1 nm)/Al (100 nm), showed the luminance of about 58,300 cd/m~2 at the low bias voltage of 7.2 V.
机译:通过分析仅空穴器件的电流密度-电压特性并分配紫外光发射光谱的能级,已经研究了掺杂MoO_x的NPB层的空穴欧姆特性。结果表明,通过同时优化N,N'-二苯基-N,N'-bis的空穴注入层(HIL)的厚度和掺杂浓度,可显着提高有机发光二极管(OLED)的性能。掺杂有氧化钼(MoO_x)的(1-萘基)-1,1'-联苯-4,4'-二胺(NPB)插入氧化铟锡(ITO)和NPB之间。对于高于25%的掺杂浓度,由玻璃/ ITO / MoO_x掺杂的NPB(100 nm)/ Al结构组成的器件显示出优异的空穴欧姆性能。对价带结构的研究表明,HTL层中的p型掺杂效应和阳极界面处的空穴浓度增加导致空穴注入势垒降低。既使用MoO_x掺杂的NPB作为空穴欧姆接触,又使用C_(60)/ LiF作为电子欧姆接触,该器件由玻璃/ ITO / MoO_x掺杂的NPB(25%,5 nm)/ NPB(63)组成。 )/ Alq_3(37 nm)/ C_(60)(5 nm)/ LiF(1 nm)/ Al(100 nm),在7.2 V的低偏置电压下显示出约58,300 cd / m〜2的亮度。

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