首页> 外文期刊>Thin Solid Films >Variations of microstructures and electrical properties of Bi_4Ti_3O_(12)/SrTiO_3/ (La_(0.5), Sr_(0.5))CoO_3/MgO epitaxial thin films by annealing
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Variations of microstructures and electrical properties of Bi_4Ti_3O_(12)/SrTiO_3/ (La_(0.5), Sr_(0.5))CoO_3/MgO epitaxial thin films by annealing

机译:Bi_4Ti_3O_(12)/ SrTiO_3 /(La_(0.5),Sr_(0.5))CoO_3 / MgO外延薄膜的微观结构和电性能的变化

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摘要

Epitaxial thin films of a heterostructure with Bi_4Ti_3O_(12)(BIT)/SrTiO_3(ST) were successfully grown with a bottom electrode consisting of La_(0.5), Sr_(0.5))CoO_3(LSCO) on MgO(001) substrates using pulsed laser deposition. The grown BIT and ST (001) planes were parallel to the growth surface with the orientation relationship of BIT <110>//ST <010>. In the as-deposited film, the BIT (001) plane appeared to expand to relieve a lattice mismatch with the ST (001) plane. However, annealing for 20-40 min induced the BIT (001) plane to contract horizontally with its c-axis expanding, which was associated with a local perturbation in the layer stacking of the BIT structure. This structural distortion was reduced in the film annealed for 1 h, with restoration of the periodicity of the layer stacking. Correspondingly, the dielectric constant of the as-deposited film was increased from 292 to 411 by annealing for 1 h. In parallel, the film was paraelectric but became more ferroelectric, with the remanent polarization and the coercive field changing from 0.1 μC/cm~2 and 14 kV/cm to 1.7 μC/cm~2 and 69 kV/cm, respectively.
机译:使用脉冲在MgO(001)衬底上成功地生长了由La_(0.5),Sr_(0.5))CoO_3(LSCO)组成的底部电极,成功地形成了Bi_4Ti_3O_(12)(BIT)/ SrTiO_3(ST)异质结构的外延薄膜。激光沉积。生长的BIT和ST(001)平面与BIT <110> // ST <010>的取向关系平行于生长表面。在沉积的薄膜中,BIT(001)平面似乎扩大了,以缓解与ST(001)平面的晶格失配。但是,退火20-40分钟会导致BIT(001)平面随其c轴扩展水平收缩,这与BIT结构的层堆叠中的局部扰动有关。在退火1 h的薄膜中,这种结构变形得以减少,并且恢复了层堆叠的周期性。相应地,通过退火1小时,沉积膜的介电常数从292增加到411。平行地,膜是顺电的,但变得更铁电,剩余极化和矫顽场分别从0.1μC/ cm〜2和14 kV / cm变化到1.7μC/ cm〜2和69 kV / cm。

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  • 来源
    《Thin Solid Films》 |2010年第20期|P.5630-5636|共7页
  • 作者单位

    Division of Materials Science and Engineering, Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Republic of Korea;

    rnDivision of Materials Science and Engineering, Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Republic of Korea;

    rnDivision of Materials Science and Engineering, Inha University, 253 Yonghyun-dong, Nam-gu, Incheon 402-751, Republic of Korea;

    rnDepartment of Materials Science and Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon-si, Cyeonggi-do 440-746, Republic of Korea;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    epitaxy; heterostructure; Bi_4Ti_3O_(12); SrTiO_3; Annealing;

    机译:外延异质结构Bi_4Ti_3O_(12);SrTiO_3;退火;

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