首页> 外文期刊>Thin Solid Films >Double subband occupation of the two-dimensional electron gas in In_xAl_(1-x)N/AlN/ GaN/AlN heterostructures with a low indium content (0.064 ≤x≤ 0.140) barrier
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Double subband occupation of the two-dimensional electron gas in In_xAl_(1-x)N/AlN/ GaN/AlN heterostructures with a low indium content (0.064 ≤x≤ 0.140) barrier

机译:铟含量低(0.064≤x≤0.140)势垒的In_xAl_(1-x)N / AlN / GaN / AlN异质结构中二维电子气的双子带占据

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摘要

We present a carrier transport study on low indium content (0.064≤x≤0.140) In_xAl_(1-x)N/AlN/GaN/AlN heterostructures. Experimental Hall data were carried out as a function of temperature (33-300 K) and a magnetic field (0-1.4 T). A two-dimensional electron gas (2DEG) with single or double subbands and a two-dimensional hole gas were extracted after implementing quantitative mobility spectrum analysis on the magnetic field dependent Hall data. The mobility of the lowest subband of 2DEG was found to be lower than the mobility of the second subband. This behavior is explained by way of interface related scattering mechanisms, and the results are supported with a one-dimensional self-consistent solution of non-linear Schrodinger-Poisson equations.
机译:我们提出了对低铟含量(0.064≤x≤0.140)In_xAl_(1-x)N / AlN / GaN / AlN异质结构的载流子传输研究。实验霍尔数据是温度(33-300 K)和磁场(0-1.4 T)的函数。在对依赖于磁场的霍尔数据进行定量迁移谱分析之后,提取具有一个或两个子带的二维电子气(2DEG)和一个二维空穴气。发现2DEG的最低子带的迁移率低于第二子带的迁移率。通过与界面相关的散射机制来解释这种行为,并且非线性Schrodinger-Poisson方程的一维自洽解支持了该结果。

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  • 来源
    《Thin Solid Films》 |2010年第19期|P.5572-5575|共4页
  • 作者单位

    Nanotecimology Research Center, Bilkent University, Bilkent, 06800 Ankara, Turkey Department of Physics, Faculty of Science and Arts, Gazi University, Teknikokullar, 06500, Ankara, Turkey;

    Department of Physics, Faculty of Science and Arts, Gazi University, Teknikokullar, 06500, Ankara, Turkey;

    Department of Physics, Faculty of Science and Arts, Gazi University, Teknikokullar, 06500, Ankara, Turkey;

    Nanotecimology Research Center, Bilkent University, Bilkent, 06800 Ankara, Turkey;

    Nanotecimology Research Center, Bilkent University, Bilkent, 06800 Ankara, Turkey;

    Department of Physics, Faculty of Science and Arts, Gazi University, Teknikokullar, 06500, Ankara, Turkey;

    Nanotecimology Research Center, Bilkent University, Bilkent, 06800 Ankara, Turkey Department of Physics, Bilkent University, Bilkent, 06800 Ankara, Turkey Department of Electrical and Electronics Engineering, Bilkent University, Bilkent, 06800 Ankara, Turkey;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    indium aluminum nitride; metal organic chemical vapor deposition; two dimensional electron gas; hall effect;

    机译:氮化铝铟金属有机化学气相沉积;二维电子气霍尔效应;

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