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首页> 外文期刊>Thin Solid Films >Electron energy loss spectroscopy of nano-scale CrAlYN/CrN-CrAlY(O)N/Cr(O)N multilayer coatings deposited by unbalanced magnetron sputtering
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Electron energy loss spectroscopy of nano-scale CrAlYN/CrN-CrAlY(O)N/Cr(O)N multilayer coatings deposited by unbalanced magnetron sputtering

机译:非平衡磁控溅射沉积纳米级CrAlYN / CrN-CrAlY(O)N / Cr(O)N多层涂层的电子能量损失谱

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摘要

The nano-scale chemical distribution and microstructure of a nitride based wear and oxidation resistant coating prepared by unbalanced magnetron sputtering was investigated. The coating consisted of multilayers of CrAlYN/CrN with a partially oxidised CrAlY(O)N/Cr(O)N oxy-nitride surface layer. The multilayer period of both the nitride and oxy-nitride layers was 3.8 ±0.2 nm. Nano-scale chemical analysis and imaging was performed using sub-nanometer resolution electron energy loss spectroscopic profiling in a spherical aberration corrected scanning transmission electron microscope. Experimentally determined fine edge structure in electron energy loss spectra were in good agreement with theoretically determined spectra, calculated using electron density functional theory. This analysis indicated the CrN layers to be near stoichiometric with a relative Cr/N ratio of 1.05 ± 0.1 while for the CrAlYN layers the best match between the 'direct chemical analysis and the simulated edges was (Cr_(0.5)Al_(0.5))N. A diffuse interface, ~ 1 nm wide was observed between the CrAlYN and CrN layers. For the outermost oxy-nitride layer, the chromium to nitrogen ratio remains approximately constant though out the layer, while the aluminium decreases as a function of increasing oxygen content.
机译:研究了通过不平衡磁控溅射制备的氮化物基耐磨耐氧化涂层的纳米级化学分布和微观结构。该涂层由具有部分氧化的CrAlY(O)N / Cr(O)N氮氧化物表面层的CrAlYN / CrN多层组成。氮化物层和氧氮化物层的多层周期均为3.8±0.2nm。纳米级化学分析和成像是在球差校正扫描透射电子显微镜中使用亚纳米级分辨率电子能量损失谱图进行的。电子能量损失谱中实验确定的精细边缘结构与使用电子密度泛函理论计算的理论确定的谱非常吻合。该分析表明CrN层接近化学计量,相对Cr / N比为1.05±0.1,而对于CrAlYN层,直接化学分析与模拟边缘之间的最佳匹配为(Cr_(0.5)Al_(0.5)) N.在CrAlYN和CrN层之间观察到约1 nm宽的扩散界面。对于最外层的氮氧化物层,铬与氮之比在整个层中保持近似恒定,而铝随氧含量的增加而减少。

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  • 来源
    《Thin Solid Films》 |2010年第18期|P.5121-5127|共7页
  • 作者单位

    Department of Engineering Materials, University of Sheffield, Mappin Street, Sheffield S1 3JD, United Kingdom;

    rnDepartment of Engineering Materials, University of Sheffield, Mappin Street, Sheffield S1 3JD, United Kingdom;

    rnInstitute for Materials Research, University of Leeds, Leeds, LS2 9JT, United Kingdom;

    rnInstitute for Materials Research, University of Leeds, Leeds, LS2 9JT, United Kingdom;

    rnSuperSTEM, Daresbury Laboratory, Keckwick Lane, Daresbury WA4 4AD, United Kingdom;

    rnSuperSTEM, Daresbury Laboratory, Keckwick Lane, Daresbury WA4 4AD, United Kingdom;

    rnSuperSTEM, Daresbury Laboratory, Keckwick Lane, Daresbury WA4 4AD, United Kingdom;

    rnMaterials and Engineering Research Institute, Sheffield Hallam University, Sheffield, S1 1WB, United Kingdom;

    rnMaterials and Engineering Research Institute, Sheffield Hallam University, Sheffield, S1 1WB, United Kingdom;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CrAlYN/CrN; aberration corrected electron microscopy; electron energy loss spectroscopy; magnetron sputtering;

    机译:CrAlYN / CrN;像差校正电子显微镜电子能量损失谱;磁控溅射;

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