机译:在(111)SrTiO_3上沉积的La_(0.5)Ca_(0.5)MnO_3薄膜的厚度依赖性微观结构变化
Max Planck Institute for Solid State Research, Heisenbergstr. 1, D-70S69, Stuttgart, Germany;
rnMax Planck Institute for Solid State Research, Heisenbergstr. 1, D-70S69, Stuttgart, Germany;
rnMax Planck Institute for Metals Research, Heisenbergstr. 3, D-70569, Stuttgart, Germany;
rnMax Planck Institute for Metals Research, Heisenbergstr. 3, D-70569, Stuttgart, Germany;
rnMax Planck Institute for Solid State Research, Heisenbergstr. 1, D-70S69, Stuttgart, Germany;
LCMO; thin film; stress relaxation; x-ray diffraction; HRTEM;
机译:在(111)SrTiO_3衬底上沉积的La_(0.5)Ca_(0.5)MnO_3薄膜的新型电子和磁性
机译:La_(0.5)Ca_(0.5)MnO_3薄膜在不同取向的SrTiO_3衬底上沉积的结构和电性能
机译:在SrTiO_3(100)上外延生长的La_(0.5)Ca_(0.5)MnO_3超薄膜上的交叉影线
机译:(La_(0.5)Pr_(0.5))_(0.7)Ca_(0.3)MnO_3外延薄膜因氧同位素取代而产生的磁阻变化
机译:通过反应磁控溅射沉积的亚稳态钛(0.5)铝(0.5)铝合金薄膜的物理性能。
机译:四(乙基甲基氨基)和四(二甲基氨基)前体在原子层沉积Hf0.5Zr0.5O2薄膜中铁电性能的比较研究
机译:PBSC0.5TA0.5O3在脉冲激光沉积中生长的厚度依赖性阳离子顺序和紊乱
机译:LaalO3上高取向Tl(0.5)pb(0.5)sr2CaCu2O7薄膜的微观结构和电子性质