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Ba_xSr_(1-x)Ti_(1.02)O_3 metal-insulator-metal capacitors on planarized alumina substrates

机译:平面化氧化铝基板上的Ba_xSr_(1-x)Ti_(1.02)O_3金属-绝缘体-金属电容器

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摘要

Nanocrystalline barium strontium titanate (Ba_xSr_(1-x)Ti_(1.02)O_3) thin films with a barium content of x = 0.8,0.9 and 1 have been fabricated in a metal-insulator-metal configuration on glass-planarized alumina substrates. Cost-effective processing measures have been utilized by using poly-crystalline alumina substrates, wet-chemical processing of the dielectric, and by a small physical area of the ferroelectric capacitors (as low as 50 μm~2 for radio frequencies measurements). Glass-planarization on alumina ceramic substrates enables barium strontium titanate films with high quality and homogeneity. We mainly focus on fine-tuning the electrical performance in the low gigahertz range (<10GHz). Extensive micro-structural and electrical characterization has been performed. Micro-structural information is obtained by: Transmission Electron Microscopy, Scanning Electron Microscopy and X-ray diffraction. The dielectric response is investigated as a function of temperature, frequency and electric field for each sample. We measured a relatively constant permittivity for typical operating temperatures of applications. The quality factor Q is between 21 and 27 at 1 GHz at zero DC bias and the tuning ratio η between 1.8 and 2.2 at |E| =0.4 MV/cm.
机译:钡含量为x = 0.8、0.9和1的纳米晶钛酸钡锶(Ba_xSr_(1-x)Ti_(1.02)O_3)薄膜已在玻璃平面化的氧化铝基板上以金属-绝缘体-金属的构造制成。通过使用多晶氧化铝基板,电介质的湿化学处理以及铁电电容器的较小物理区域(对于射频测量低至50μm〜2),已采用了具有成本效益的处理措施。在氧化铝陶瓷基体上进行玻璃平面化处理可以使钛酸钡锶薄膜具有高质量和均匀性。我们主要专注于微调低千兆赫兹范围(<10GHz)的电气性能。已经进行了广泛的微观结构和电学表征。通过以下方式获得微观结构信息:透射电子显微镜,扫描电子显微镜和X射线衍射。对于每个样品,将介电响应作为温度,频率和电场的函数进行研究。我们测量了典型应用温度下相对恒定的介电常数。在零直流偏置下,品质因数Q在1 GHz时在21和27之间,在| E |时的调谐比η在1.8和2.2之间。 = 0.4MV / cm。

著录项

  • 来源
    《Thin Solid Films》 |2010年第10期|2854-2859|共6页
  • 作者单位

    MESA+ Institute for Nanotechnology, Semiconductor Components, University of Twente, 7500 AE Enschede, The Netherlands;

    NXP Semiconductors, Corporate I &TI Research, 5656 AE Eindhoven, The Netherlands;

    Philips Research Laboratories, 565S AE Eindhoven, The Netherlands;

    Philips Research Laboratories, 565S AE Eindhoven, The Netherlands;

    Philips Research Laboratories, 565S AE Eindhoven, The Netherlands;

    MESA+ Institute for Nanotechnology, Semiconductor Components, University of Twente, 7500 AE Enschede, The Netherlands;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    aluminium oxide; ceramics; glass; ferroelectric properties; electron microscopy; x-ray diffraction;

    机译:氧化铝陶瓷;玻璃;铁电性能电子显微镜;X射线衍射;

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